Influence of substrate temperature on structural, optical properties and dielectric results of nano- ZnO thin films prepared by Radio Frequency technique

被引:50
作者
Ali, A. I. [1 ]
Ammar, A. H. [2 ]
Moez, A. Abdel [3 ]
机构
[1] Helwan Univ, Fac Ind Educ, Dept Basic Sci, Cairo, Egypt
[2] Ain Shams Univ, Fac Educ, Dept Phys, Thin Film Lab, Cairo 11757, Egypt
[3] NRC, Phys Res Div, Dept Solid State Phys, Cairo 12622, Egypt
关键词
Nano-ZnO thin films; RF sputtering; Different substrate temperature; Structure; Optical properties; Effective mass; Dispersion energy and dielectric constants; HEAT-TREATMENT; HYDROGEN INCORPORATION; LUMINESCENT PROPERTIES; GAS SENSORS; SOLAR-CELLS; AL FILMS; TRANSPARENT; GROWTH; NANOCRYSTALS; DEPENDENCE;
D O I
10.1016/j.spmi.2013.11.007
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
A Radio Frequency (RF) technique was used to prepare ZnO thin films with different substrate temperature under ultra high vacuum. Structure results revealed that these films have crystalline structure. The structure of these films was carried out using Xray Diffraction and Atomic Force Electron Microscope (AFM). The grain size for these films were determined using AFM photos. The optical parameters such as, optical energy gap, refractive index, extinction coefficient, dielectric loss and dielectric tangent loss for these films were determined. Another important parameters such as dispersion energy, oscillating energy and the ratio between the free carrier concentration/effective mass (N/m*) were determined optically. It was found that, the substrate temperature for these investigated films plays an important rule for changing an optical and dielectric results of these films. (C) 2013 Elsevier Ltd. All rights reserved.
引用
收藏
页码:285 / 298
页数:14
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