Laser chemical vapor deposition of thin films

Laser chemical vapor deposition (LCVD) is a technique to deposit thin film of oxidation, corrosion, and wear resistant materials as well as electronic, optoelectronic, and superconductor materials. The shape and morphology, which affect the properties of such films, depend on the laser parameters and the processing conditions. This paper presents a mathematical model to predict the shape of the deposits. Also, this model allows to select the appropriate process parameters to obtain a good quality film. The Damkohler number is shown to influence the morphology of the film. Also, an optimum condition is found to exist for depositing thin film by using the LCVD technique. Copyright (C) 1996 Elsevier Science S.A.