Deviation from threshold model in ultrafast laser ablation of graphene at sub-micron scale

被引：11

作者：

Gil-Villalba, A. ^{[1
]}

Xie, C. ^{[1
]}

Salut, R. ^{[1
]}

Furfaro, L. ^{[1
]}

Giust, R. ^{[1
]}

Jacquot, M. ^{[1
]}

Lacourt, P. A. ^{[1
]}

Dudley, J. M. ^{[1
]}

Courvoisier, F. ^{[1
]}

机构：

[1] Univ Bourgogne Franche Comte, UMR CNRS 6174, Inst FEMTO ST, F-25030 Besancon, France

来源：

APPLIED PHYSICS LETTERS | 2015年 / 107卷 / 06期

关键词：

FEMTOSECOND BESSEL BEAMS; SINGLE-LAYER GRAPHENE; INTERFERENCE LITHOGRAPHY; DEPENDENCE; PULSES;

D O I：

10.1063/1.4928391

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We investigate a method to measure ultrafast laser ablation threshold with respect to spot size. We use structured complex beams to generate a pattern of craters in CVD graphene with a single laser pulse. A direct comparison between beam profile and SEM characterization allows us to determine the dependence of ablation probability on spot-size, for crater diameters ranging between 700 nm and 2.5 mu m. We report a drastic decrease of ablation probability when the crater diameter is below 1 mu m which we interpret in terms of free-carrier diffusion. (C) 2015 AIP Publishing LLC.

引用

页数：5

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