Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application

被引：14
作者：
Lee, Chang-Soo [1 ]
Kim, Jungwon [2 ]
Son, J. Y. [1 ]
Maeng, W. J. [1 ]
Jo, Du-Hwan [3 ]
Choi, Wonyong [2 ]
Kim, Hyungjun [1 ]
机构：
[1] Pohang Univ Sci & Technol, Dept Mat Sci & Engn, Pohang 790784, South Korea
[2] Pohang Univ Sci & Technol, Sch Environm Sci & Engn, Pohang 790784, South Korea
[3] POSCO Tech Res Labs, Surface Technol Res Grp, Gwangyang 545090, South Korea
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 2009年 / 156卷 / 05期
关键词：
ATOMIC LAYER DEPOSITION; LASER DEPOSITION; STAINLESS-STEEL; TITANIUM-OXIDE; GLASS; SURFACES; WATER; ELECTRODES; PHOTOLYSIS;
D O I：
10.1149/1.3095515
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
Plasma-enhanced atomic layer deposition (PE-ALD) of TiO2 thin films using Ti(NMe2)(4) [tetrakis(dimethylamido) Ti] and O-2 plasma were prepared on stainless steel to show the self-cleaning effect. The TiO2 thin films deposited on stainless steel have high growth rate, large surface roughness, and low impurities. The film deposited below 200 degrees C was amorphous, while the films deposited at 300 and 400 degrees C showed anatase and rutile phases, respectively. The contact angle measurements on crystalline PE-ALD TiO2 thin films exhibited superhydrophilicity after UV irradiation. The TiO2 thin film with anatase phase deposited at 300 degrees C showed the highest photocatalytic efficiency, which is higher than on Activ glass or thermal ALD TiO2 films. We suggest that anatase structure and large surface area of TiO2 thin film on stainless steel are the main factors for the high photocatalytic efficiency. (C) 2009 The Electrochemical Society. [DOI: 10.1149/1.3095515] All rights reserved.
引用
收藏
页码：D188 / D192
页数：5
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