Robust Compact Model for Bipolar Oxide-Based Resistive Switching Memories

被引:91
作者
Bocquet, Marc [1 ]
Deleruyelle, Damien [1 ]
Aziza, Hassen [1 ]
Muller, Christophe [1 ]
Portal, Jean-Michel [1 ]
Cabout, Thomas [2 ]
Jalaguier, Eric [2 ]
机构
[1] Aix Marseille Univ, IM2NP, F-13451 Marseille 20, France
[2] CEA Leti, F-38054 Grenoble 9, France
关键词
Bipolar switching; compact model; memory modeling; resistive RAM (RRAM); resistive switching; transition metal oxide; DRIVEN ION MIGRATION; TEMPERATURE; MECHANISMS; TI;
D O I
10.1109/TED.2013.2296793
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Emerging nonvolatile memories based on resistive switching mechanisms pull intense research and development efforts from both academia and industry. Oxide-based resistive random access memories (OxRAM) gather noteworthy performances, such as fast WRITE/READ speed, low power, high endurance, and large integration density that outperform conventional flash memories. To fully explore new design concepts, such as distributed memory in logic or biomimetic architectures, robust OxRAM compact models must be developed and implemented into electrical simulators to assess performances at a circuit level. In this paper, we propose a physics-based compact model used in electrical simulator for bipolar OxRAM memories. After uncovering the theoretical background and the set of relevant physical parameters, this model is confronted to experimental electrical data. The excellent agreement with these data suggests that this model can be confidently implemented into circuit simulators for design purpose.
引用
收藏
页码:674 / 681
页数:8
相关论文
共 34 条
[1]   Pairing of cation vacancies and gap-state creation in TiO2 and HfO2 [J].
Ahn, Hyo-Shin ;
Han, Seungwu ;
Hwang, Cheol Seong .
APPLIED PHYSICS LETTERS, 2007, 90 (25)
[2]   Resistive Random Access Memory (ReRAM) Based on Metal Oxides [J].
Akinaga, Hiroyuki ;
Shima, Hisashi .
PROCEEDINGS OF THE IEEE, 2010, 98 (12) :2237-2251
[3]  
[Anonymous], 2012, P 2012 C VLSI TECHN, DOI DOI 10.1109/VLSI-TSA.2012.6210102
[4]  
[Anonymous], 2010, IEEE IEDM
[5]  
[Anonymous], P IEEE INT MEM WORKS
[6]  
[Anonymous], P IEEE INT REL PHYS
[7]  
[Anonymous], P INT EL DEV M IEDM
[8]  
[Anonymous], P IEEE IEDM DEC
[9]  
[Anonymous], 2001, ELECTROCHEMICAL METH
[10]  
[Anonymous], P IEEE IEDM DEC