The impact of mechanical stress on the degradation of AlGaN/GaN high electron mobility transistors

被引:53
作者
Choi, Sukwon [1 ]
Heller, Eric [2 ]
Dorsey, Donald [2 ]
Vetury, Ramakrishna [3 ]
Graham, Samuel [1 ]
机构
[1] Georgia Inst Technol, George W Woodruff Sch Mech Engn, Atlanta, GA 30332 USA
[2] Air Force Res Lab, Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USA
[3] RFMD, Power Broadband Business Unit, Charlotte, NC 28269 USA
关键词
THERMAL-CONDUCTIVITY; ELASTIC-CONSTANTS; GAN; HEMTS; SPECTROSCOPY; TEMPERATURE; RELIABILITY; RESISTANCE; EXPANSION; VOLTAGE;
D O I
10.1063/1.4826524
中图分类号
O59 [应用物理学];
学科分类号
摘要
Coupled electro-thermo-mechanical simulation and Raman thermometry were utilized to analyze the evolution of mechanical stress in AlGaN/GaN high electron mobility transistors (HEMTs). This combined analysis was correlated with electrical step stress tests to determine the influence of mechanical stress on the degradation of actual devices under diverse bias conditions. It was found that the total stress as opposed to one dominant stress component correlated the best with the degradation of the HEMT devices. These results suggest that minimizing the total stress as opposed to the inverse piezoelectric stress in the device is necessary in order to avoid device degradation which can be accomplished through various growth methods. (C) 2013 AIP Publishing LLC.
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页数:10
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