Structure and properties of multi-targets magnetron sputtered ZrNbTaTiW multi-elements alloy thin films

被引：46

作者：

Feng, Xingguo ^{[1
]}

Tang, Guangze ^{[2
]}

Sun, Mingren ^{[2
]}

Ma, Xinxin ^{[3
]}

Wang, Liqing ^{[4
]}

Yukimura, Ken ^{[1
]}

机构：

[1] Harbin Inst Technol, Sch Mat Sci & Engn, Harbin 150001, Peoples R China

[2] Harbin Inst Technol, Natl Key Lab Sci & Technol Precis Hot Proc Met, Harbin 150001, Peoples R China

[3] Harbin Inst Technol, State Key Lab Adv Welding & Joining, Harbin 150001, Peoples R China

[4] Harbin Inst Technol, Sch Mechatron Engn, Harbin 150001, Peoples R China

来源：

SURFACE & COATINGS TECHNOLOGY | 2013年 / 228卷

关键词：

Multi-elements alloy films; Multi-targets magnetron sputtering; Structure; Hardness; MICROSTRUCTURE;

D O I：

10.1016/j.surfcoat.2012.05.038

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

We have studied the deposition of ZrNbTaTiW multi-elements alloy thin films on Si (111) substrates by multi-targets magnetron sputtering process. The chemical composition, constituent phase, grain morphology and hardness were investigated using XRF, XRD, FESEM and nano-indenter. The amorphous structure was formed in the film when the atomic percent of Zr exceeded 35%. The value of the hardness and modulus were in the range of 5.9 to 11.5 and 134.4 to 190.4 GPa, respectively. Both of the structure and property of multi-elements alloy films strongly depended on the films composition. (C) 2012 Elsevier B.V. All rights reserved.

引用

页码：S424 / S427

页数：4

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