The Growth Control of Zn1-xMgxO Films and Photo-Electrical Property Research

被引:0
作者
Wang, Xiaoheng [1 ]
Zhou, Xiang [1 ]
Zhang, Guang [1 ]
机构
[1] Beijing Inst Environm Features, Beijing 100854, Peoples R China
来源
PROCEEDINGS OF THE 2014 INTERNATIONAL CONFERENCE ON MATERIALS SCIENCE AND ENERGY ENGINEERING (CMSEE 2014) | 2015年
关键词
Ultrasonic Spray Pyrolysis; ZnxMg1-xO Films; Thickness of the Film; Energy gap; Photoluminescence; ULTRASONIC SPRAY-PYROLYSIS; MOLECULAR-BEAM EPITAXY; SUPERLATTICES; DEPOSITION; MGXZN1-XO; EXCITONS; ZNO/(MG;
D O I
暂无
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
Here we propose ultrasonic spray pyrolysis (USP) method to produce ZnxMg1-xO films. In this work, we have grown two sets of films differ by HAc amount and Mg content in the precursor solution. By slightly increasing HAc amount it succeed in making the film thicker in the order of 10(2) nm, replacing prolonged deposition time. The energy gap of Zn1-xMgxO linearly grows from 3.13eV (x=0) to 3.35eV as Mg content increases, fitting the equation of Eg = 3.13+0.78x (eV). The blue shift of PL peaks from 380nm (x=0.0) to 364nm (x=0.28) confirms effective Mg doping. Further the un-doped ZnO film exhibit a bright band edge photoluminescence at 380nm with FWHM of 16nm without defect luminescence.
引用
收藏
页码:320 / 326
页数:7
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