Microstructure and properties of nanostructured thick CrN coatings

被引：17

作者：

Lin, Jianliang ^{[1
]}

Sproul, William D. ^{[1
,2
]}

Moore, John J. ^{[1
]}

机构：

[1] Colorado Sch Mines, Dept Met & Mat Engn, ACSEL, Golden, CO 80401 USA

[2] React Sputtering Inc, San Marcos, CA 92078 USA

来源：

MATERIALS LETTERS | 2012年 / 89卷

关键词：

CrN coating; Thick coating; Modulated pulsed power magnetron sputtering (MPPMS); High power pulsed magnetron sputtering (HPPMS); Wear; BEAM-ENHANCED-DEPOSITION; FILMS;

D O I：

10.1016/j.matlet.2012.08.060

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Thick polycrystalline CrN coatings (20 mu m) were deposited at a high deposition rate (10 mu m/h) using a highly ionized plasma generated by modulated pulsed power magnetron sputtering. The microstructure of the thick CrN coating was characterized using transmission electron microscopy. The coating exhibited a super dense microstructure with a grain size in the nanometer range of 100-150 nm. The thick CrN coating showed an average high hardness of 24 CPa, excellent adhesion and wear resistant. Published by Elsevier B.V.

引用

页码：55 / 58

页数：4

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