Stitching periodic submicron fringes by utilizing step-and-align interference lithography

被引：10
作者：
Chen, Yung-Pin [1 ,2 ]
Chen, Cheng-Hung [3 ]
Chang, Jer-Haur [1 ,2 ]
Chiu, Hsin-Chieh [1 ,2 ]
Chen, Guan-Yu [1 ,2 ]
Chiang, Chieh-Hsiu [1 ,2 ]
Chen, Lien-Sheng [3 ]
Tseng, Ching-Tung [1 ,2 ]
Lee, Chih-Hsien [1 ,2 ]
Yen, Jia-Yush [3 ]
Wang, Lon A. [1 ,2 ]
机构：
[1] Natl Taiwan Univ, Dept Elect Engn, Taipei 10617, Taiwan
[2] Natl Taiwan Univ, Grad Inst Photon & Optoelect, Photon & Nanostruct Lab, Taipei 10617, Taiwan
[3] Natl Taiwan Univ, Dept Mech Engn, Precis Syst Control Lab, Taipei 10617, Taiwan
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2009年 / 27卷 / 06期
关键词：
diffraction gratings; light interference; lithography; masks; optical fabrication; MICROSTRUCTURES; FABRICATION;
D O I：
10.1116/1.3258152
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The authors develop a step-and-align interference lithography system to fabricate large-area periodic submicron structures by stitching the unit exposure area step-by-step. A metal mask with a square transparent window in the center is used to intercept the quasi-flat-top region of the expanded Gaussian beam, and thus it serves as a beamshaper to approximate the ideal unit beam that has uniform intensity and spatial coherence. Two-dimensional precision dual-actuator motion stages could provide travel distance for full wafer exposure with 2 nm high precision positioning capability for stitching the submicron patterns. The gratings with period of 700 nm are successfully stitched along two directions on 100 mm diameter wafers.
引用
收藏
页码：2951 / 2957
页数：7
相关论文
共 14 条
[1]   Fabrication of Moth-Eye Structure on Glass by Ultraviolet Imprinting Process with Polymer Template [J].
Bae, Byeong-Ju ;
Hong, Sung-Hoon ;
Hong, Eun-Ju ;
Lee, Heon ;
Jung, Gun-young .
JAPANESE JOURNAL OF APPLIED PHYSICS, 2009, 48 (01)
[2]   Stellar And Galactic Environment survey (SAGE) [J].
Barstow, M. A. ;
Kowalski, M. P. ;
Cruddace, R. G. ;
Wood, K. S. ;
Auchere, F. ;
Bannister, N. J. ;
Bode, M. F. ;
Bromage, G. E. ;
Burleigh, M. R. ;
Cameron, A. C. ;
Cassatella, A. ;
Delmotte, F. ;
Doyle, J. G. ;
Gaensicke, B. ;
Gibson, B. ;
Jeffery, C. S. ;
Jordan, C. ;
Kappelmann, N. ;
Lallement, R. ;
Lapington, J. S. ;
de Martino, D. ;
Matthews, S. A. ;
Orio, M. ;
Pace, E. ;
Pagano, I. ;
Phillips, K. J. H. ;
Ravet, M. -F. ;
Schmitt, J. H. M. M. ;
Welsh, B. Y. ;
Werner, K. ;
Del Zanna, G. .
EXPERIMENTAL ASTRONOMY, 2009, 23 (01) :169-191
[3]   Spatial-frequency multiplication with multilevel interference lithography [J].
Chang, Chih-Hao ;
Zhao, Y. ;
Heilmann, R. K. ;
Schattenburg, M. L. .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2008, 26 (06) :2135-2138
[4]   Nanometer-accurate grating fabrication with scanning beam interference lithography [J].
Chen, CG ;
Konkola, PT ;
Heilmann, RK ;
Joo, C ;
Schattenburg, ML .
NANO- AND MICROTECHNOLOGY: MATERIALS, PROCESSES, PACKAGING, AND SYSTEMS, 2002, 4936 :126-134
[5]  
CHEN CH, 2009, P ASME IEEE 2009 INT
[6]   Fabrication of a dense array of tall nanostructures over a large sample area with sidewall profile and tip sharpness control [J].
Choi, Chang-Hwan ;
Kim, Chang-Jin .
NANOTECHNOLOGY, 2006, 17 (21) :5326-5333
[7]   Green light emission in silicon through slow-light enhanced third-harmonic generation in photonic-crystal waveguides [J].
Corcoran, B. ;
Monat, C. ;
Grillet, C. ;
Moss, D. J. ;
Eggleton, B. J. ;
White, T. P. ;
O'Faolain, L. ;
Krauss, T. F. .
NATURE PHOTONICS, 2009, 3 (04) :206-210
[8]   Some application cases and related manufacturing techniques for optically functional microstructures on large areas [J].
Gombert, A ;
Blasi, B ;
Bühler, C ;
Nitz, P ;
Mick, J ;
Hossfeld, W ;
Niggemann, M .
OPTICAL ENGINEERING, 2004, 43 (11) :2525-2533
[9]   Dimensional metrology for nanometre-scale science and engineering: towards sub-nanometre accurate encoders [J].
Heilmann, RK ;
Chen, CG ;
Konkola, PT ;
Schattenburg, ML .
NANOTECHNOLOGY, 2004, 15 (10) :S504-S511
[10]  
HSU KH, 2008, P SPIE, V6832
12