Fabrication and characterization of facing-target reactive sputtered polycrystalline TiO2 films

被引：14

作者：

Li, G. K. ^{[1
]}

Shen, J. J. ^{[1
]}

Mi, W. B. ^{[1
]}

Li, Z. Q. ^{[1
]}

Wu, P. ^{[1
]}

Jiang, E. Y. ^{[1
]}

Bai, H. L. ^{[1
]}

机构：

[1] Tianjin Univ, Fac Sci, Inst Adv Mat Phys, Tianjin Key Lab Low Dimens Mat Phys & Preparing T, Tianjin 300072, Peoples R China

来源：

APPLIED SURFACE SCIENCE | 2006年 / 253卷 / 02期

基金：

中国国家自然科学基金;

关键词：

TiO2; films; anatase; rutile; optical band gap;

D O I：

10.1016/j.apsusc.2005.12.080

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Polycrystalline TiO2 films were fabricated using dc facing-target reactive sputtering at different sputtering pressures. The films deposited consist of pure anatase phase or a mixture of anatase and rutile and increasing rutile content to some extent deteriorates the crystallinity of the anatase. It was found that the plasma heating effect, which plays the role of substrate heating, is an important factor for the crystallinity of the films in the case of without substrate heating. The roughness of the films increases monotonically with the increase of the sputtering pressure, which can be ascribed to the decrease in the mobility of the impinging particles. UV-vis transmission measurements reveal that the pure anatase films have higher transmittance than those having mixed phases of anatase and rutile. The band gap value decreases from similar to 3.35 to 3.29 eV owing to the increase in the fraction of rutile phase. (c) 2005 Elsevier B.V. All rights reserved.

引用

页码：425 / 431

页数：7

共 25 条

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