Er0.4Bi1.6O3 thin films in situ crystallized at low temperature onto the Gd0.1Ce0.9O1.95 bulk electrolytes via Facing Target Sputtering

被引：4

作者：

Jeung, Ji-Na ^{[1
]}

Eom, Ji-Ho ^{[2
]}

Park, Byeong-Ju ^{[2
]}

Kim, Sun-Dong ^{[3
]}

Yoon, Soon-Gil ^{[1
,2
]}

机构：

[1] Chungnam Natl Univ, Adv Circuit Substrate Engn, Daeduck 34134, Daejeon, South Korea

[2] Chungnam Natl Univ, Dept Mat Sci & Engn, Daeduck 34134, Daejeon, South Korea

[3] Korea Inst Energy Res, Energy Mat Ctr, 152 Gajeong Ro, Daejeon 34129, South Korea

来源：

CURRENT APPLIED PHYSICS | 2017年 / 17卷 / 05期

基金：

新加坡国家研究基金会;

关键词：

On-axis sputtering; Facing-Target Sputtering; Low-temperature crystallization; High-step coverage; Ionic conductivity; OXIDE FUEL-CELLS; BILAYER ELECTROLYTES; PERFORMANCE; FABRICATION; ANODE; SOFCS; CERIA;

D O I：

10.1016/j.cap.2017.02.010

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

For large-area Er0.4Bi1.6O3 (ESB) films on the Gd0.1Ce0.9O1.95 (GDC) pellets, the 300 nm-thick ESB films were deposited on the 0.2 cm-thick GDC pellets at different temperatures via on-axis sputtering and Facing-Target Sputtering (FTS) for enhancement of the ionic conductivity of the GDC. The ESB films deposited on the GDC pellets via FTS show a good step-coverage and a well-crystallization at a low temperature of 300 degrees C. The ESB/GDC bilayers with lower activation energy than GDC single layer showed an enhanced ionic conductivity in intermediate-temperature range from 500 to 700 degrees C. FTS is an attractive method for the ESB film deposition for low-temperature crystallization on the high-roughened GDC pellets. (C) 2017 Elsevier B.V. All rights reserved.

引用

页码：751 / 755

页数：5

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