Fabrication of CoPt magnetic nanodot arrays by electrodeposition process

被引：30

作者：

Ouchi, Takanari ^{[1
]}

Arikawa, Yuki ^{[1
]}

Homma, Takayuki ^{[1
]}

机构：

[1] Waseda Univ, Dept Appl Chem, Shinjuku Ku, Tokyo 1698555, Japan

来源：

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 2008年 / 320卷 / 22期

关键词：

Patterned media; Electrodeposition; CoPt; Nanoimprinting lithography; Electron beam lithography;

D O I：

10.1016/j.jmmm.2008.08.022

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We attempted to fabricate patterned media using the electrochemical deposition process along with nanopatterned substrates prepared by the electron beam lithography (EBL), UV nanoimprint lithography (UV-NIL), and spin-on-glass nanoimprint lithography (SOG-NIL) approaches. CoPt was electrodeposited into the nanopatterned substrates and chemical mechanical polishing was carried out to planarize the surface. It was clarified that CoPt nanodot arrays were successfully deposited into the patterned nanopores fabricated by UV-NIL and SOG-NIL as well as by EBL with high area selectivity and uniformity. The density of the CoPt nanodot arrays deposited into the nanopores fabricated by EBL was equal up to an areal recording density of 250 Gbit/in(2). (C) 2008 Elsevier B. V. All rights reserved.

引用

页码：3104 / 3107

页数：4

共 14 条

[1] Fabrication and magnetic properties of CoPt perpendicular patterned media [J].