RF - Plasma Source Commissioning in Indian Negative Ion Facility

The Indian program of the RF based negative ion source has started off with the commissioning of ROBIN, the inductively coupled RF based negative ion source facility under establishment at Institute for Plasma research (IPR), India. The facility is being developed under a technology transfer agreement with IPP Garching. It consists of a single RF driver based beam source (BATMAN replica) coupled to a 100 kW, 1 MHz RF generator with a self excited oscillator, through a matching network, for plasma production and ion extraction and acceleration. The delivery of the RF generator and the RF plasma source without the accelerator, has enabled initiation of plasma production experiments. The recent experimental campaign has established the matching circuit parameters that result in plasma production with density in the range of 0.5 - 1 x 10(18) / m(3), at operational gas pressures ranging between 0.4 - 1 Pa. Various configurations of the matching network have been experimented upon to obtain a stable operation of the set up for RF powers ranging between 25 - 85 kW and pulse lengths ranging between 4-20 s. It has been observed that the range of the parameters of the matching circuit, over which the frequency of the power supply is stable, is narrow and further experiments with increased number of turns in the coil are in the pipeline to see if the range can be widened. In this paper, the description of the experimental system and the commissioning data related to the optimisation of the various parameters of the matching network, to obtain stable plasma of required density, are presented and discussed.