Guided-mode resonant grating filter fabricated on silicon-on-insulator substrate

被引：28
|
作者：
Kanamori, Y [1 ]
Kitani, T [1 ]
Hane, K [1 ]
机构：
[1] Tohoku Univ, Dept Nanomech, Aoba Ku, Sendai, Miyagi 9808579, Japan
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2006年 / 45卷 / 3A期
关键词：
D O I：
10.1143/JJAP.45.1883
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
We propose a guided-mode resonant grating (GMRG) filter using silicon-on-insulator wafer. In the fabrication, electron beam lithography and fast atom beam etching are used. The periods of the three filters are 680, 700, and 720 inn, respectively. The reflectivity is measured to be nearly 100% at the wavelength of 1502 nm for the 700 nm period GMRG filter with a fill factor of 0.760. The optical properties of the filters are analyzed using a rigorous coupled-wave analysis (RCWA).
引用
收藏
页码：1883 / 1885
页数：3
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