Development of W/C Soft x-ray Multilayer Mirror by Ion Beam Sputtering (IBS) System for below 50Å Wavelength

被引：1

作者：

Biswas, A. ^{[1
]}

Bhattacharyya, D. ^{[1
]}

机构：

[1] Bhabha Atom Res Ctr, Appl Spect Div, Bombay 400085, Maharashtra, India

来源：

INDIAN VACUUM SOCIETY SYMPOSIUM ON THIN FILMS: SCIENCE & TECHNOLOGY | 2012年 / 1451卷

关键词：

soft X-ray multilayer; GIXR; Ellipsometry;

D O I：

10.1063/1.4732374

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A home-made Ion Beam Sputtering (IBS) system has been developed in our laboratory. Using the IBS system single layer W and single layer C film has been deposited at 1000eV Ar ion energy and 10mA ion current. The W-film has been characterized by grazing Incidence X-ray reflectrometry (GIXR) technique and Atomic Force Microscope technique. The single layer C-film has been characterized by Spectroscopic Ellipsometric technique. At the same deposition condition 25-layer W/C multilayer film has been deposited which has been designed for using as mirror at 30 degrees grazing incidence angle around 50 angstrom wavelength. The multilayer sample has been characterized by measuring reflectivity of CuK alpha radiation and soft x-ray radiation around 50 angstrom wavelength.

引用

页码：79 / 81

页数：3

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