Electrical transport behavior of lead-free 0.5Ba(Zr0.2Ti0.8)O3-0.5 (Ba0.7Ca0.3)TiO3 thin film grown on LaNiO3/Si by pulsed laser deposition

被引:14
作者
Bhardwaj, Chandan
Kaur, Davinder [1 ]
机构
[1] Indian Inst Technol, Dept Phys, Funct Nanomat Res Lab, Roorkee 247667, Uttar Pradesh, India
关键词
Ferroelectrics; Thin films; Laser deposition; Electrical transport;
D O I
10.1016/j.jallcom.2014.01.160
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The temperature and voltage-polarity dependent leakage current behavior of pulsed laser deposited Ag/ 0.5Ba(Zr0.2Ti0.8)O-3-0.5(Ba0.7Ca0.3)TiO3/LaNiO3 thin-film capacitor is thoroughly investigated. At fields below 50 kV/cm, the leakage current is Ohmic across both the interfaces. The negative differential resistance behavior is observed in low fields at 300 K. The space charge limited current, with distinct trap-filling and trap-filled regions, dominates positive bias current at medium fields (60-150 kV/cm) and higher temperatures, whereas, the Poole-Frenkel Emission governs the conduction above150 kV/cm. The onset field of Poole-Frenkel Emission decreases with the increasing temperature. Schottky Emission controls the negative bias current at higher fields with 0.43 eV zero field barrier height. (C) 2014 Elsevier B.V. All rights reserved.
引用
收藏
页码:158 / 163
页数:6
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