Kinetic Monte Carlo simulations of self organized nanostructures on Ta surface fabricated by low energy ion sputtering

被引：9

作者：

Joshi, Shalik Ram ^{[1
]}

Bagarti, Trilochan ^{[2
]}

Varma, Shikha ^{[1
]}

机构：

[1] Inst Phys, Bhubaneswar 751005, Orissa, India

[2] Harish Chandra Res Inst, Allahabad 211019, Uttar Pradesh, India

来源：

SURFACE SCIENCE | 2015年 / 641卷

关键词：

Kinetic Monte carlo simulations; Tantalum; Atomic force microscopy; INSTABILITY; GROWTH; MORPHOLOGY; EROSION; MODELS; DOTS;

D O I：

10.1016/j.susc.2015.07.002

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Surfaces bombarded with low energy ion beams often display development of self assembled patterns and quasi-periodic structures. Kinetic Monte Carlo simulations have been performed to describe ion sputtered Tantalum surfaces. A weak nonlinearity in the relaxation process has been introduced and the results show that the positive Schwoebel barrier, produced by the nonlinear Hamiltonian, is necessary in describing ion bombarded Tantalum surfaces. Furthermore, their scaling exponents suggest presence of a class other than KPZ. (C) 2015 Elsevier B.V. All rights reserved.

引用

页码：170 / 173

页数：4