Rutile titanium dioxide films deposited with a vacuum arc at different temperatures

被引:7
作者
Franco Arias, L. [1 ]
Kleiman, A. [1 ]
Heredia, E. [2 ]
Marquez, A. [1 ]
机构
[1] CONICET UBA, Inst Fis Plasma, Ciudad Univ,Pab 1, RA-1428 Buenos Aires, DF, Argentina
[2] CINSO, CONICET, CITEDEF, Martelli, Argentina
来源
14TH LATIN AMERICAN WORKSHOP ON PLASMA PHYSICS (LAWPP 2011) | 2012年 / 370卷
关键词
TIO2; FILMS; STRUCTURAL-PROPERTIES; EVAPORATION;
D O I
10.1088/1742-6596/370/1/012027
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Rutile crystalline phase of TiO2 has been one of the most investigated materials for medical applications. Its implementation as a surface layer on biomedical implants has shown to improve hemocompatibility and biocompatibility. In this work, titanium dioxide coatings were deposited on glass and steel 316L substrates using cathodic arc deposition. The coatings were obtained at different substrate temperatures; varying from room temperature to 600 degrees C. The crystalline structure of the films was identified by glancing angle X-ray diffraction. Depending on the substrate material and on its temperature during the deposition process, anatase, anatse+rutile and rutile structures were observed. It was determined that rutile films can be obtained below 600 degrees C with this deposition method.
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页数:5
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