Noise-Induced Resistance Broadening in Resistive Switching Memory-Part II: Array Statistics

被引:59
作者
Ambrogio, Stefano [1 ]
Balatti, Simone [1 ]
McCaffrey, Vincent [2 ]
Wang, Daniel C. [2 ]
Ielmini, Daniele [1 ]
机构
[1] Politecn Milan, Italian Univ Nanoelect Team, Dipartimento Elettron Informaz & Bioingn, I-20133 Milan, Italy
[2] Adesto Technol, Sunnyvale, CA 94089 USA
关键词
Low-frequency noise; memory reliability; random telegraph noise (RTN); reliability modeling; resistive switching memory (RRAM); statistical Monte Carlo modeling; FLUCTUATIONS;
D O I
10.1109/TED.2015.2477135
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Noise in resistive switching memory (RRAM) is among the main concerns due to its impact on the reliability of single-bit and multilevel cell devices. Although noise in typical RRAM cells is understood fairly well, the statistics of noise and the presence and impact of statistical tails in the current fluctuation is what mostly affects the RRAM reliability at the array level. This paper addresses current noise in RRAM arrays, focusing on high-resistance state distribution and its broadening with time. We highlight two main contributions to the tail behavior, namely, random walk (RW) and random telegraph noise (RTN) with random start and stop. We provide evidence for a time decay of RW amplitude with time, which we explain by time-dependent stabilization of defects. We finally develop a statistical Monte Carlo model for noise, which is capable of explaining the broadening of the resistance distribution based on a physical description of RW and RTN components.
引用
收藏
页码:3812 / 3819
页数:8
相关论文
共 18 条
  • [1] Statistical Fluctuations in HfOx Resistive-Switching Memory: Part II-Random Telegraph Noise
    Ambrogio, Stefano
    Balatti, Simone
    Cubeta, Antonio
    Calderoni, Alessandro
    Ramaswamy, Nirmal
    Ielmini, Daniele
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2014, 61 (08) : 2920 - 2927
  • [2] Statistical Fluctuations in HfOx Resistive-Switching Memory: Part I - Set/Reset Variability
    Ambrogio, Stefano
    Balatti, Simone
    Cubeta, Antonio
    Calderoni, Alessandro
    Ramaswamy, Nirmal
    Ielmini, Daniele
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2014, 61 (08) : 2912 - 2919
  • [3] Impact of the Mechanical Stress on Switching Characteristics of Electrochemical Resistive Memory
    Ambrogio, Stefano
    Balatti, Simone
    Choi, Seol
    Ielmini, Daniele
    [J]. ADVANCED MATERIALS, 2014, 26 (23) : 3885 - 3892
  • [4] [Anonymous], IEEE T ELEC IN PRESS
  • [5] [Anonymous], IEDM
  • [6] Size-Dependent Drift of Resistance Due to Surface Defect Relaxation in Conductive-Bridge Memory
    Choi, Seol
    Balatti, Simone
    Nardi, Federico
    Ielmini, Daniele
    [J]. IEEE ELECTRON DEVICE LETTERS, 2012, 33 (08) : 1189 - 1191
  • [7] Polarization dependent two-photon properties in an organic crystal
    Fang, Hong-Hua
    Yang, Jie
    Ding, Ran
    Chen, Qi-Dai
    Wang, Lei
    Xia, Hong
    Feng, Jing
    Ma, Yu-Guang
    Sun, Hong-Bo
    [J]. APPLIED PHYSICS LETTERS, 2010, 97 (10)
  • [8] Current Conduction Model for Oxide-Based Resistive Random Access Memory Verified by Low-Frequency Noise Analysis
    Fang, Z.
    Yu, H. Y.
    Fan, W. J.
    Ghibaudo, G.
    Buckley, J.
    DeSalvo, B.
    Li, X.
    Wang, X. P.
    Lo, G. Q.
    Kwong, D. L.
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2013, 60 (03) : 1272 - 1275
  • [9] Temperature acceleration of structural relaxation in amorphous Ge2Sb2Te5
    Ielmini, D.
    Lavizzari, S.
    Sharma, D.
    Lacaita, A. L.
    [J]. APPLIED PHYSICS LETTERS, 2008, 92 (19)
  • [10] Resistance-dependent amplitude of random telegraph-signal noise in resistive switching memories
    Ielmini, Daniele
    Nardi, Federico
    Cagli, Carlo
    [J]. APPLIED PHYSICS LETTERS, 2010, 96 (05)