Bias-enhanced nucleation of oriented diamond on single-crystalline 6H-SiC substrates

被引:2
作者
Li, X [1 ]
Hayashi, Y [1 ]
Lilov, S [1 ]
Nishino, S [1 ]
机构
[1] UNIV SOFIA, FAC PHYS, DEPT SEMICOND PHYS, BU-1126 SOFIA, BULGARIA
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1997年 / 36卷 / 10B期
关键词
BEN; CVD; diamond films; nucleation; 6H-SiC;
D O I
10.1143/JJAP.36.L1370
中图分类号
O59 [应用物理学];
学科分类号
摘要
A bias-enhanced nucleation (BEN) technique in hot-filament chemical vapor deposition (HF-CVD) has been applied to single-crystalline 6H-SiC substrates for the deposition of oriented diamond films, The results of scanning electron microscopy (SEM) showed that on the (<000(1)over bar>) face not only oriented diamond films with the relationship (111) Dia.//(<000(1)over bar>) 6H-SiC and [110] Dia.//[<11(2)over bar 0>] 6H-SiC, but also that high nucleation density (>10(9) cm(-2)) has been achieved. In the case of deposition on the (0001) face of the GH-SIC under the same experimental conditions, although the nucleation density of diamond was enhanced (above 10(9) cm(-2)), however, oriented diamond was not observed, The diamond nucleation density is greater on the (0001) face than on the (<000(1)over bar>)) face. The differences in oriented nucleation and nucleation density on these two faces are attributed to the difference of their specific free surface energy and chemical bonds.
引用
收藏
页码:L1370 / L1373
页数:4
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