Synthesis of novel polymers containing photoacid generator and its application in atomic force microscope lithography

被引：6

作者：

Kwun, Gijin ^{[1
]}

Jang, Eujean ^{[1
]}

Kwon, Gwangmin ^{[2
]}

Lee, Haiwon ^{[1
,2
]}

机构：

[1] Hanyang Univ, Dept Chem, Seoul 133791, South Korea

[2] Hanyang Univ, Dept Nanoscale Semicond Engn, Seoul 133791, South Korea

来源：

CURRENT APPLIED PHYSICS | 2009年 / 9卷

关键词：

Photoacid generator (PAG); Atomic force microscope (AFM); AFM anodization lithography; Lithographic speed;

D O I：

10.1016/j.cap.2008.08.036

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A photoacid generator (PAG) played an important role in withdrawing an electron in atomic force microcopy (AFM) anodization lithography. In case of the silicon substrate coated by the polymer with higher content of PAG, oxide patterns were fabricated in lower threshold lithographic bias. And the oxide patterns were grown bigger on the PAG polymer coated silicon than on bare silicon. These results indicate that PAG contributes to accept electrons sufficient to grow oxide patterns. The organic resist including PAG will be effective material to improve the lithographic speed of AFM anodization. (c) 2008 Elsevier B.V. All rights reserved.

引用

页码：S121 / S123

页数：3

共 7 条

[1] Optical and electrical properties of aluminum oxide films deposited by spray pyrolysis [J].