Improvement in overall photoelectric properties of Ag/FTO bilayer thin films using furnace/laser dual annealing

被引：32

作者：

Huang, Li-jing ^{[1
,2
]}

Ren, Nai-fei ^{[2
,3
]}

Li, Bao-jia ^{[1
,2
]}

Zhou, Ming ^{[2
,4
]}

机构：

[1] Jiangsu Univ, Sch Mat Sci & Engn, Zhenjiang 212013, Peoples R China

[2] Jiangsu Univ, Jiangsu Prov Key Lab, Ctr Photon Mfg Sci & Technol, Zhenjiang 212013, Peoples R China

[3] Jiangsu Univ, Sch Mech Engn, Zhenjiang 212013, Peoples R China

[4] Tsinghua Univ, State Key Lab Tribol, Beijing 100084, Peoples R China

来源：

MATERIALS LETTERS | 2014年 / 116卷

关键词：

Thin films; Laser processing; FTO; Photoelectric property; Annealing; OPTICAL-PROPERTIES; LASER; FLUORINE;

D O I：

10.1016/j.matlet.2013.11.079

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Silver (Ag)/fluorine-doped tin oxide (FTO) bilayer films were prepared by sputtering Ag layers on commercial FTO glass. The effects of traditional furnace annealing, nanosecond pulsed laser annealing and furnace/laser dual annealing on the structure and photoelectric properties of the Ag/FTO films were investigated. It is found that all the annealing methods increased the grain size of the films, leading to enhancement of the transmittance and conductivity. Traditional furnace annealing at 400 degrees C for 20 min brought about the formation of smaller Ag nanograins, while subsequent 532 nm nanosecond pulsed laser annealing with a fluence of 0.9 J/cm(2) melted the Ag nanograins to conglomerate with larger SnO2 grains, resulting in the highest figure of merit of 1.7 x 10(-2) Omega(-1). The results indicate that furnace/laser dual annealing is a more effective method for improving overall photoelectric properties of FTO-based films. (C) 2013 Elsevier B.V. All rights reserved.

引用

页码：405 / 407

页数：3

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