Polishing-induced contamination of fused silica optics and laser induced damage density at 351 nm

被引：211

作者：

Neauport, J

Lamaignere, L

Bercegol, H

Pilon, F

Birolleau, JC

机构：

[1] CEA, CESTA, F-33114 Le Barp, France

[2] CEA Ripault, F-37260 Monts, France

来源：

OPTICS EXPRESS | 2005年 / 13卷 / 25期

关键词：

D O I：

10.1364/OPEX.13.010163

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

In this paper we study the effect of contamination induced by fabrication process on laser damage density of fused silica polished parts at 351 nm in nanosecond regime. We show, owing to recent developments of our raster scan metrology, that a good correlation exists between damage density and concentration of certain contaminants for the considered parts. (c) 2005 Optical Society of America.

引用

页码：10163 / 10171

页数：9

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