Tunable atomic force microscopy bias lithography on electron beam induced carbonaceous platforms

Tunable local electrochemical and physical modifications on the carbonaceous platforms are achieved using Atomic force microscope (AFM) bias lithography. These carbonaceous platforms are produced on Si substrate by the technique called electron beam induced carbonaceous deposition (EBICD). EBICD is composed of functionalized carbon species, confirmed through X-ray photoelectron spectroscopy (XPS) analysis. AFM bias lithography in tapping mode with a positive tip bias resulted in the nucleation of attoliter water on the EBICD surface under moderate humidity conditions (45%). While the lithography in the contact mode with a negative tip bias caused the electrochemical modifications such as anodic oxidation and etching of the EBICD under moderate (45%) and higher (60%) humidity conditions respectively. Finally, reversible charge patterns are created on these EBICD surfaces under low (30%) humidity conditions and investigated by means of electrostatic force microscopy (EFM). (C) 2013 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution 3.0 Unported License.