Thermal decomposition studies of the polyhedral oligomeric silsesquioxane, POSSh, and when it is impregnated with the metallocene bis(η5-cyclopentadienyl)zirconium (IV) dichloride or immobilized on silica

被引:5
作者
Bianchini, D.
Butler, I. S. [1 ]
Barsan, M. M. [1 ]
Martens, W. [2 ]
Frost, R. L. [2 ]
Galland, G. B. [3 ]
dos Santos, J. H. Z. [3 ]
机构
[1] McGill Univ, Dept Chem, Montreal, PQ H3A 2K6, Canada
[2] Queensland Univ Technol, Inorgan Mat Res Program, Sch Phys & Chem Sci, Brisbane, Qld 4001, Australia
[3] Univ Fed Rio Grande do Sul, Inst Quim, BR-91501970 Porto Alegre, RS, Brazil
基金
加拿大自然科学与工程研究理事会;
关键词
polyhedral oligomeric silsesquioxane; Cp2ZrCl2; SiO2; infrared emission spectroscopy; thermogravimetric analysis;
D O I
10.1016/j.saa.2007.11.006
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
摘要
Thermal decomposition studies of the free polyhedral oligomeric silsesquioxane, POSSh, and when this compound has been impregnated with Cp2ZrCl2 (CP=eta(5)-C5H5) or immobilized on SiO2 were conducted using infrared emission spectroscopy (IES) over a 100-1000 degrees C temperature range and by thermogravimetric analysis (TGA). The organic groups in POSSh, apparently decompose thermally into Si-CH3, Si-H and other fragments. Upon impregnation with Cp2ZrCl2, however, a different thermal decomposition pathway was followed and new infrared emission bands appeared in the 1000-900 cm(-1) region suggesting the formation of Si-O-Zr moieties. When immobilized on SiO2 and subjected to thermal decomposition, the POSSh compound lost its organic groups and the inorganic structure remaining was incorporated into the SiO2 framework. (C) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:45 / 52
页数:8
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