Gamma non-ionizing energy loss: Comparison with the damage factor in silicon devices

被引:20
作者
El Allam, E. [1 ]
Inguimbert, C. [2 ]
Meulenberg, A. [3 ]
Jorio, A. [1 ]
Zorkani, I. [1 ]
机构
[1] Univ Sidi Mohamed Ben Abdellah, Solid State Phys Lab, Fac Sci Dhar El Mahraz, PB 1796, Atlas Fez, Morocco
[2] ONERA DPhIEE, 2 Ave E Belin, F-31055 Toulouse, France
[3] Sci Humanity Trust Inc, Tucker, GA 30084 USA
关键词
DISPLACEMENT DAMAGE; NIEL; SEMICONDUCTORS; RADIATION; SPACE;
D O I
10.1063/1.5013211
中图分类号
O59 [应用物理学];
学科分类号
摘要
The concept of non-ionizing energy loss (NIEL) has been demonstrated to be a successful approach to describe the displacement damage effects in silicon materials and devices. However, some discrepancies exist in the literature between experimental damage factors and theoretical NIELs. Co-60 gamma rays having a low NIEL are an interesting particle source that can be used to validate the NIEL scaling approach. This paper presents different Co-60 gamma ray NIEL values for silicon targets. They are compared with the radiation-induced increase in the thermal generation rate of carriers per unit fluence. The differences between the different models, including one using molecular dynamics, are discussed. Published by AIP Publishing.
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页数:5
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