Quasi-Optical Notch Filters for Plasma Imaging Applications

被引：0
|
作者：
Liang, Tianran [1 ]
Domier, Calvin W. [1 ]
Shen, Zuowei [1 ]
Luhmann, Neville C., Jr. [1 ]
机构：
[1] Univ Calif Davis, Davis, CA 95616 USA
来源：
2008 33RD INTERNATIONAL CONFERENCE ON INFRARED, MILLIMETER AND TERAHERTZ WAVES, VOLS 1 AND 2 | 2008年
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Quasi-optical notch filters are employed to protect plasma imaging arrays from stray radiation from high power electron cyclotron resonance heating (ECRH) sources. A new imaging arrangement permits stacking of multiple filters to maximize ECRH rejection. Simulations indicate that a stack of three filters can provide a notch depth of > 60 dB at 140 GHz, and retain this high rejection over an incident angle range of +/- 80 degrees.
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收藏
页码：755 / 756
页数：2
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