Chemical state and phase structure of (TaNbTiW)N films prepared by combined magnetron sputtering and PBII

被引：10
作者：
Feng, Xingguo [1 ]
Tang, Guangze [2 ]
Sun, Mingren [3 ]
Ma, Xinxin [1 ]
Wang, Liqin [4 ]
机构：
[1] Harbin Inst Technol, State Key Lab Adv Welding & Joining, Harbin 150001, Peoples R China
[2] Harbin Inst Technol, Natl Key Lab Mat Behav & Evaluat Space Environm, Harbin 150001, Peoples R China
[3] Harbin Inst Technol, Natl Key Lab Sci & Technol Precis Hot Proc Met, Harbin 150001, Peoples R China
[4] Harbin Inst Technol, Sch Mechatron Engn, Harbin 150001, Peoples R China
来源：
APPLIED SURFACE SCIENCE | 2013年 / 280卷
关键词：
(TaNbTiW)N films; Magnetron sputtering; Ion implantation; XPS; XRD; MECHANICAL-PROPERTIES; ION-IMPLANTATION; NITROGEN; ALLOY; ARC; ENERGY; BEAM; XPS;
D O I：
10.1016/j.apsusc.2013.05.001
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
(TaNbTiW)N films with thickness of similar to 1000 nm are prepared on titanium alloy substrate by combined magnetron sputtering deposition and nitrogen plasma based ion implantation (N-PBII). Chemical state of the elements and phase structure of the films are investigated using X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD), respectively. The bonds of Ta-N, Nb-N, Ti-N-O and Ta-O are detected in the (TaNbTiW) N films, however both W-N and W-O are not found. The initial alloy film has a BCC structure, while the films with N-PBII treatment are composed of BCC and FCC structures. The hardness and elastic modulus of the films can be improved by increasing nitrogen implantation dose and reach maximum values of 9.0 GPa and 154.1 GPa, respectively. (C) 2013 Elsevier B.V. All rights reserved.
引用
收藏
页码：388 / 393
页数：6
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