Fabrication of boron doped diamond chip electrodes for single drop analysis

被引：6

作者：

Sugitani, Ai ^{[1
]}

Katayama, Michinobu ^{[2
]}

Watanabe, Takeshi ^{[1
]}

Matsumoto, Yoshinori ^{[2
]}

Einaga, Yasuaki ^{[1
,3
]}

机构：

[1] Keio Univ, Dept Chem, Yokohama, Kanagawa 2238522, Japan

[2] Keio Univ, Dept Appl Phys & Physicoinformat, Yokohama, Kanagawa 2238522, Japan

[3] JST, CREST, Yokohama, Kanagawa 2238522, Japan

来源：

RSC ADVANCES | 2013年 / 3卷 / 48期

关键词：

ELECTROCHEMICAL OXIDATION; VOLTAMMETRY; OXALATE; FILMS; ACID;

D O I：

10.1039/c3ra44090g

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

As a prototype for a "highly sensitive electrochemical detection system for single drop analysis using boron-doped diamond (BDD) electrodes", a three-electrode system for the measurement of samples consisting of a single drop was fabricated. An Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) system, employing the Bosch process in order to realize high-aspect-ratio near vertical structures, was used to etch the BDD. A single drop (10 mu L) was analyzed using the resulting fabricated 'BDD chip electrode' which exhibited the typical superior electrochemical properties of BDD electrodes.

引用

页码：25636 / 25639

页数：4

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