Late-news poster: High-frequency performance of sub-micrometer channel-length Si TFTs fabricated on large grain poly-Si films

被引:3
|
作者
Kawachi, Genshiro [1 ]
Mitani, Masahiro [1 ]
Okada, Takashi [1 ]
Tsuboi, Shinzo [1 ]
机构
[1] Adv LCD Technol Dev Ctr Co Ltd, Yokohama, Kanagawa 2440817, Japan
来源
2007 SID INTERNATIONAL SYMPOSIUM, DIGEST OF TECHNICAL PAPERS, VOL XXXVIII, BOOKS I AND II | 2007年 / 38卷
关键词
D O I
10.1889/1.2785283
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
High-frequency characteristics of sub-micron Si TFTs fabricated oil large-grain poly-Si films are demonstrated for the first lime. A cutoff frequency (f(T)) of 6GHz and a maximum oscillation frequency (f(max)) of 25 GHz were obtained for the TFT with a channel length of 0.5 mu m. It was confirmed that use of insulating substrates is advantageous to reduce the parasitic of 25 GHz were obtained for the TFT with a channel length of 0.5 mu m. It was confirmed that use of insulating substrates is advantageous to reduce the parasitic susceptance due to a conductive substrate, thereby increasing f(max) .
引用
收藏
页码:276 / 279
页数:4
相关论文
共 8 条
  • [1] Superior High-Frequency Performance of T-Gated Poly-Si TFTs
    Huang, Y. A.
    Liang, C. Y.
    Peng, K. P.
    Lin, H. C.
    Li, P. W.
    Chen, K. M.
    Huang, G. W.
    2021 INTERNATIONAL SYMPOSIUM ON VLSI TECHNOLOGY, SYSTEMS AND APPLICATIONS (VLSI-TSA), 2021,
  • [2] P-190L: Late-news poster: Thermal durability of poly-Si films on highly engineered glass for RTA processes enabling advanced TFTs
    Itoh, Taketsugu
    Mugiraneza, Jean D.
    Miyahira, Tomoyuki
    Sakamoto, Akinori
    Chen, Yeh
    Okada, Tasuya
    Noguchi, Takashi
    48th Annual SID Symposium, Seminar, and Exhibition 2010, Display Week 2010, 2010, 3 : 1486 - 1489
  • [3] Channel Thickness Effect on High-Frequency Performance of Poly-Si Thin-Film Transistors
    Chen, Kun-Ming
    Tsai, Tzu-I
    Lin, Ting-Yao
    Lin, Horng-Chih
    Chao, Tien-Sheng
    Huang, Guo-Wei
    Huang, Tiao-Yuan
    IEEE ELECTRON DEVICE LETTERS, 2013, 34 (08) : 1020 - 1022
  • [4] Gate electrode microstructure having stacked large-grain poly-Si with ultra-thin SiOx interlayer for reliability in sub-micrometer CMOS
    Ito, H
    Sasaki, M
    Kimizuka, N
    Uwasawa, K
    Nakamura, N
    Ito, T
    Goto, Y
    Watanuki, S
    Ueda, T
    Horiuchi, T
    INTERNATIONAL ELECTRON DEVICES MEETING - 1997, TECHNICAL DIGEST, 1997, : 635 - 638
  • [5] Effects of Channel Width on High-Frequency Characteristics of Trigate Poly-Si Thin-Film Transistors Fabricated by Microwave Annealing
    Hu, Hsin-Hui
    Wang, Kai-Min
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2015, 62 (09) : 2883 - 2887
  • [6] High performance poly-Si TFTs fabricated by continuous-wave laser annealing of metal-induced lateral crystallised silicon films
    Chang, C. -P.
    Wu, Y. S.
    ELECTRONICS LETTERS, 2008, 44 (19) : 1157 - U21
  • [7] Lateral Grain Growth of Amorphous Silicon Films With Wide Thickness Range by Blue Laser Annealing and Application to High Performance Poly-Si TFTs
    Jin, Seonghyun
    Choe, Younwoo
    Lee, Suhui
    Kim, Tae-Woong
    Mativenga, Mallory
    Jang, Jin
    IEEE ELECTRON DEVICE LETTERS, 2016, 37 (03) : 291 - 294
  • [8] Analysis of 0.5 μm channel Al/WSix/Poly-Si gate performance in high-frequency band Si power MOSFETs with process/device/circuit continuous simulation
    Kataoka, M
    Komuro, K
    Fujita, K
    Taniguchi, A
    SOLID-STATE ELECTRONICS, 1999, 43 (09) : 1689 - 1694