Ammonothermal growth of bulk GaN

被引:57
作者
Hashimoto, Tadao [1 ,2 ]
Wu, Feng [1 ,2 ]
Speck, James S. [1 ,2 ]
Nakamura, Shuji [1 ,2 ]
机构
[1] Univ Calif Santa Barbara, Dept Mat, Santa Barbara, CA 93106 USA
[2] Japan Sci & Technol Agcy, NICP ERATO UCSB Grp, Tokyo, Japan
关键词
growth from solutions; single crystal growth; nitrides; semiconducting gallium compounds;
D O I
10.1016/j.jcrysgro.2008.06.005
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Bulk GaN crystals have been realized by the basic ammonothermal method. Three-dimensional polyhedron-shaped crystals in size of approximately 5 mm and their sliced wafers demonstrated the feasibility of the basic ammonothermal method to produce GaN wafers. Clear crystallographic facets of N face and m planes were observed although Ga face was decorated with angled facets of {10 (1) over bar1} planes. The growth rate and growth nature showed distinct anisotropy. The transmission electron microscopy revealed high quality of microstructure, whereas selective etching and X-ray diffraction revealed multiple grains, which were presumably caused by insufficient structural quality of seed crystals. (c) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码:3907 / 3910
页数:4
相关论文
共 50 条
  • [41] Effect of Mn and Mg dopants on vacancy defect formation in ammonothermal GaN
    Heikkinen, T.
    Pavlov, J.
    Ceponis, T.
    Gaubas, E.
    Zajac, M.
    Tuomisto, F.
    JOURNAL OF CRYSTAL GROWTH, 2020, 547
  • [42] Progress in ammonothermal crystal growth of indium nitride
    Becker, Peter
    Niewa, Rainer
    JOURNAL OF CRYSTAL GROWTH, 2022, 581
  • [43] Enhanced growth rate for ammonothermal gallium nitride crystal growth using ammonium iodide mineralizer
    Tomida, D.
    Kagamitani, Y.
    Bao, Q.
    Hazu, K.
    Sawayama, H.
    Chichibu, S. F.
    Yokoyama, C.
    Fukuda, T.
    Ishiguro, T.
    JOURNAL OF CRYSTAL GROWTH, 2012, 353 (01) : 59 - 62
  • [44] Growth of bulk GaN single crystals by the pressure-controlled solution growth method
    Inoue, T
    Seki, Y
    Oda, O
    Kurai, S
    Yamada, Y
    Taguchi, T
    JOURNAL OF CRYSTAL GROWTH, 2001, 229 (01) : 35 - 40
  • [45] Optimization of low temperature GaN buffer layers for halide vapor phase epitaxy growth of bulk GaN
    Hemmingsson, Carl
    Pozina, Galia
    JOURNAL OF CRYSTAL GROWTH, 2013, 366 : 61 - 66
  • [46] In situ X-ray monitoring of transport and chemistry of Ga-containing intermediates under ammonothermal growth conditions of GaN
    Schimmel, S.
    Duchstein, P.
    Steigerwald, T. G.
    Kimmel, A-C L.
    Schluecker, E.
    Zahn, D.
    Niewa, R.
    Wellmann, P.
    JOURNAL OF CRYSTAL GROWTH, 2018, 498 : 214 - 223
  • [47] Development of GaN wafers for solid-state lighting via the ammonothermal method
    Letts, Edward
    Hashimoto, Tadao
    Ikari, Masanori
    Nojima, Yoshihiro
    JOURNAL OF CRYSTAL GROWTH, 2012, 350 (01) : 66 - 68
  • [48] HVPE-GaN grown on MOCVD-GaN/sapphire template and ammonothermal GaN seeds: Comparison of structural, optical, and electrical properties
    Sochacki, Tomasz
    Bryan, Zachary
    Amilusik, Mikolaj
    Bobea, Milena
    Fijalkowski, Michal
    Bryan, Isaac
    Lucznik, Boleslaw
    Collazo, Ramon
    Weyher, Jan L.
    Kucharski, Robert
    Grzegory, Izabella
    Bockowski, Michal
    Sitar, Zlatko
    JOURNAL OF CRYSTAL GROWTH, 2014, 394 : 55 - 60
  • [49] Resistivity of manganese doped GaN grown by near equilibrium ammonothermal (NEAT) method
    Hashimoto, Tadao
    Key, Daryl
    Letts, Edward
    Gaddy, Mathew
    Gregory, Austin
    Dickens, James
    West, Tim
    Zhao, Wei
    Guo, Mengzhe
    Buyuklimanli, Temel
    JOURNAL OF CRYSTAL GROWTH, 2023, 621
  • [50] Effects of ammonia gas on threshold pressure and seed growth for bulk GaN single crystals by Na flux method
    Iwahashi, T
    Kawamura, F
    Morishita, M
    Kai, Y
    Yoshimura, M
    Mori, Y
    Sasaki, T
    JOURNAL OF CRYSTAL GROWTH, 2003, 253 (1-4) : 1 - 5