Investigation on charged particles in inductively coupled Ar/O2 plasmas: The role of Ar proportion

被引:6
作者
Zhao, Xin-Qian [1 ]
Liang, Ying-Shuang [2 ]
Guo, Yuan-Yuan [1 ,3 ]
机构
[1] Univ Sci & Technol Liaoning, Sch Mat & Met, Anshan 114051, Liaoning, Peoples R China
[2] Univ Sci & Technol Liaoning, Sch Sci, Anshan 114051, Liaoning, Peoples R China
[3] Anhui Univ Technol, Key Lab Green Fabricat & Surface Technol Adv Met, Maanshan 243002, Peoples R China
基金
中国国家自然科学基金;
关键词
OXYGEN DISCHARGES; MODEL; RECOMBINATION;
D O I
10.1063/5.0098152
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
In this paper, a 2D fluid model is built to reveal the inductively coupled Ar/O-2 plasma behavior at 300W, 30 mTorr, in the gas mixture of 95% Ar -5% O-2 and 10% Ar -90% O-2. The reliability of the model is first verified by comparing the calculated results with the experimental data, and the consistent results are obtained. Then, the spatial distributions of the charged species densities are investigated. As Ar fraction decreases, the maximum densities of charged particles shift toward the coil significantly, and the O-2(+) becomes the dominant positive ion at higher O-2 fractions. The main reaction mechanisms are also discussed. It is concluded that the electrons are generated by the ionization of background gases, and the Ar+ ions are primarily formed by the ionization of Ar. However, the charge exchange processes account for the most production of O-2(+) and O+ ions at a high Ar fraction. The loss at the walls is the most important process to the consumption of positive ions. For the O- ions, they are first generated by the dissociative attachment of O-2 at ground state, followed by the metastable state, and they are destroyed either by the ion-ion recombination with Ar+ ions or the detachment with O atoms as the Ar proportion varies. Finally, the effect of the ion-ion recombination reaction rate coefficients is discussed. The results indicate that rate coefficients of the recombination reactions have a significant influence on the positive ion densities when the Ar fractions are high. Published under an exclusive license by AIP Publishing.
引用
收藏
页数:12
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