Structural instability of 4H-SiC polytype induced by n-type doping

被引:135
作者
Liu, JQ [1 ]
Chung, HJ [1 ]
Kuhr, T [1 ]
Li, Q [1 ]
Skowronski, M [1 ]
机构
[1] Carnegie Mellon Univ, Dept Mat Sci & Engn, Pittsburgh, PA 15213 USA
关键词
Silicon carbide - Stacking faults - Processing - Dislocations (crystals) - Doping (additives);
D O I
10.1063/1.1463203
中图分类号
O59 [应用物理学];
学科分类号
摘要
Spontaneous formation of stacking faults in heavily nitrogen-doped 4H-polytype silicon carbide crystals have been observed by transmission electron microscopy (TEM). Faults were present in as-grown boules and additional faults were generated by annealing in argon at 1150 degreesC. All faults had identical structure consisting of six layers stacked in a cubic sequence as determined by high-resolution TEM, and were interpreted as a result of two Shockley partial dislocations gliding on two neighboring basal planes of SiC. It is argued that the energy of faulted 4H silicon carbide is lower than the energy of perfect heavily doped (n>1x10(19) cm(-3)) crystal at typical processing temperatures, thus providing a driving force for transformation. (C) 2002 American Institute of Physics.
引用
收藏
页码:2111 / 2113
页数:3
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