Titration of submonolayer Au growth on Si(111)

被引：28

作者：

Kautz, J. ^{[1
]}

Copel, M. W. ^{[2
]}

Gordon, M. S. ^{[2
]}

Tromp, R. M. ^{[1
,2
]}

van der Molen, S. J. ^{[1
]}

机构：

[1] Leiden Univ, Kamerlingh Onnes Lab, NL-2300 RA Leiden, Netherlands

[2] IBM Corp, Div Res, Thomas J Watson Res Ctr, Yorktown Hts, NY 10598 USA

来源：

PHYSICAL REVIEW B | 2014年 / 89卷 / 03期

关键词：

VICINAL SI(111); ELECTRON-MICROSCOPY; ATOMIC-STRUCTURE; SURFACE; RECONSTRUCTION; DIFFRACTION; SYSTEM;

D O I：

10.1103/PhysRevB.89.035416

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We study and analyze the growth of submonolayers of Au on Si(111) by a complementary set of surface techniques. Specifically, we focus on the 5 x 2 and the alpha root 3 x root 3 structures. We determine the gold coverage of these structures as a function of temperature by means of low energy electron diffraction (LEED) and low energy electron microscopy (LEEM). These results are independently calibrated by ex-situ ion scattering experiments. This allows us to present a phase diagram for this system. Remarkably, for all temperatures considered (8201040 K), we find a coverage for the 5 x 2 phase that is significantly (approximate to 10%) higher than the value of 0.6 monolayers which is assumed in the latest structural models. Therefore, a further refinement of the present picture of the quasi-one-dimensional 5 x 2 structure is required.

引用

页数：6

共 35 条

[1] Structure of the Si(111)-(5 x 2)-Au Surface [J].