Plasma cleaning and its applications for electron microscopy

被引：80
作者：
Isabell, TC
Fischione, PE
O'Keefe, C
Guruz, MU
Dravid, VP
机构：
[1] Foschione Res, Export, PA 15632 USA
[2] Philips Electron Opt Inc, Mahwah, NJ 07430 USA
[3] Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA
来源：
MICROSCOPY AND MICROANALYSIS | 1999年 / 5卷 / 02期
关键词：
plasma cleaning; electron energy-loss spectrometry (EELS); energy dispersive X-ray spectrometry (EDS); specimen preparation; inductive plasma;
D O I：
10.1017/S1431927699000094
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The effectiveness of applying a high-frequency, low-energy, reactive gas plasma for the removal of hydrocarbon contamination from specimens and components for electron microscopy has been investigated with a variety of analytical techniques. Transmission electron microscopy (TEM) analysis of specimens that have been plasma cleaned shows an elimination of the carbonaceous contamination from the specimen. With extended cleaning times the removal of existing carbon contamination debris due to previously conducted microanalysis is shown. Following plasma cleaning, specimens may be examined in the electron microscope for several hours without exhibiting evidence of recontamination. The effectiveness of plasma cleaning is not limited to applications for TEM specimens. Scanning electron microscopy (SEM) specimens that have been plasma cleaned likewise show an elimination of carbonaceous contamination. Furthermore, other electron microscopy parts and accessories, such as aperture strips, specimen damping rings, and Wehnelts, among others, can benefit from plasma cleaning.
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收藏
页码：126 / 135
页数：10
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