Application of Raman spectrometry for the characterization of complex oxide thin films grown by MOCVD

被引:3
作者
Güttler, B
Gorbenko, OY
Novozhilov, MA
Samoilenkov, SV
Amelichev, VA
Wahl, G
Zandbergen, HW
机构
[1] PTB, D-38116 Braunschweig, Germany
[2] Moscow MV Lomonosov State Univ, Dept Chem, Moscow 119899, Russia
[3] TU Braunschweig, IOPW, D-38108 Braunschweig, Germany
[4] Delft Univ Technol, Natl Ctr HREM, Delft, Netherlands
来源
JOURNAL DE PHYSIQUE IV | 1999年 / 9卷 / P8期
关键词
D O I
10.1051/jp4:19998147
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Thin epitaxial films of complex oxide materials including superconductors RBa2Cu3O7.delta (R=Ho,Lu), CMR manganites R(1-x)A(x)MnO(3) (R = La, Pr, Nd; A = Ca, Sr), conducting perovskites La0.5Sr0.5CoO3LaNiO3 were prepared by aerosol and flash MOCVD. The application of Raman spectrometry was found to be an unique possibility for a non-destructive control of the oxygen content of the material in films (including the analysis of the oxygen isotope content) and the appearance of secondary phases. In particular cases, the phase analysis can be carried out for very small amounts of impurity phase exceeding the detection limit provided by other techniques, such as X-ray diffraction or EDX element analysis. Advances in the measurement technique have expanded:facilities of Raman spectrometry to the analysis of perovskite thin films with only minor deviations from a cubic symmetry. As a result, delicate variations of the structure with the composition of thin film perovskite-like solid solutions were studied.
引用
收藏
页码:1179 / 1186
页数:8
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