Dielectric modeling of transmittance spectra of thin ZnO:Al films

被引:117
作者
Qiao, ZH
Agashe, C
Mergel, D [1 ]
机构
[1] Univ Essen Gesamthsch, Dept Phys, WG Thin Film Technol, D-45117 Essen, Germany
[2] Forschungszentrum Julich, Inst Photovoltaik, D-52425 Julich, Germany
关键词
zinc oxide (563); electrical properties (112); optical properties (345);
D O I
10.1016/j.tsf.2005.08.282
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A dielectric model comprising band gap transitions and free electron excitations (Drude model) is successfully applied to simulate transmittance spectra of ZnO films doped with 0.5%, 1% and 2% Al. The Drude formula contains a frequency-dependent damping term in order to get a good fit in the visible spectral region. Useful physical parameters obtained from the fit are electron density and mobility within the grains, film thickness, band gap and refractive index. The optically determined film thickness agrees with that obtained with the stylus method within 2%. The optically determined electronic parameters are compared with those obtained by electrical measurements. Contrary to thin In2O3:Sn films, the Drude mobility inside the grains is similar to the direct current Hall mobility indicating more perfect film growth without forming pronounced grain boundaries. Maximum value is 35 cm(2)/V s. The effective electron mass is estimated to be about 0.6 of the free electron mass. The refractive index at 550 run decreases with increasing electron density. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:520 / 525
页数:6
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