Low-energy ion precipitation structures associated with pulsating auroral patches

被引:17
作者
Liang, Jun [1 ]
Donovan, E. [1 ]
Nishimura, Y. [2 ]
Yang, B. [1 ]
Spanswick, E. [1 ]
Asamura, K. [3 ]
Sakanoi, T. [4 ]
Evans, D. [5 ]
Redmon, R. [5 ]
机构
[1] Univ Calgary, Dept Phys & Astron, Calgary, AB T2N 1N4, Canada
[2] Univ Calif Los Angeles, Dept Atmospher & Ocean Sci, Los Angeles, CA 90024 USA
[3] JAXA, Inst Space & Aeronaut Sci, Chofu, Tokyo, Japan
[4] Tohoku Univ, Planetary Plasma & Atmospher Res Ctr, Sendai, Miyagi 980, Japan
[5] NOAA, NGDC, Boulder, CO USA
关键词
pulsating auroral patch; low-energy ion precipitation structure; plasma outflows; MAGNETOSPHERIC CONVECTION; INNER MAGNETOSPHERE; INDEX SATELLITE; ELECTRIC-FIELDS; VLF EMISSIONS; PLASMA; REGION; CHORUS; ACCELERATION; INSTABILITY;
D O I
10.1002/2015JA021094
中图分类号
P1 [天文学];
学科分类号
0704 ;
摘要
Pulsating auroras often appear in forms of geo-stable or slowly convecting patches. These patches can maintain their rough shape and size over many sequences of luminosity pulsations, yet they slowly drift with ionospheric ExB convection. Because of these characteristics, there has long been a speculation that the pulsating auroral patch (PAP) is connected to flux tubes filled with enhanced cold plasma. In this study, we perform a survey on pulsating auroral events when the footprints of low-Earth-orbit satellites traversed the PAPs, with a focus on the low-energy particle signatures associated with the PAPs. As a result, we identified, in a majority (similar to 2/3) of events, the existence of a low-energy ion precipitation structure that is collocated with the PAP, with core energies ranging from several tens of eV up to a few hundred eV. This result supports the hypothesis that a PAP connects to flux tubes filled with enhanced cold plasma. We further propose that the plasma outflows from the ionosphere are the origin of such cold plasma flux tubes. We suggest that the PAP is formed by a combination of high-energy electrons of a magnetospheric origin, the low-energy plasma structure of an ionospheric origin, and certain ELF/VLF waves that are intensified and modulated in interactions with both the hot and cold plasma populations.
引用
收藏
页码:5408 / 5431
页数:24
相关论文
共 40 条
  • [31] The effect of carbon impurities on molybdenum surface morphology evolution under high-flux low-energy helium ion irradiation
    Tripathi, J. K.
    Novakowski, T. J.
    Gonderman, S.
    Bharadwaj, N.
    Hassanein, A.
    JOURNAL OF NUCLEAR MATERIALS, 2016, 478 : 287 - 294
  • [32] Performance enhancement of organic thin-film transistors by low-energy argon ion beam treatment of gate dielectric surface
    Kang, Sungku
    Park, Jaeyoung
    Jung, Sukrno
    Lee, Hoo-Jeong
    Son, Philkook
    Kim, Jae Chang
    Yoon, Tae-Hoon
    Yi, Moonsuk
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2007, 46 (4B): : 2696 - 2699
  • [33] Role of ion accumulation in lofting of submicrometer-sized dielectric particle from dielectric surface by plasma and low-energy electron beam
    Krainov, Pavel
    Ivanov, Vladimir
    Astakhov, Dmitry
    Medvedev, Slava
    van de Kerkhof, Mark
    OPTICAL AND EUV NANOLITHOGRAPHY XXXV, 2022, 12051
  • [34] Low-energy O+ ion beam induced chemical vapor deposition using hexamethyldisilane or hexamethyldisilazane for silicon dioxide film formation
    Yoshimura, Satoru
    Sugimoto, Satoshi
    Takeuchi, Takae
    Kiuchi, Masato
    AIP ADVANCES, 2021, 11 (12)
  • [35] Injection of low-energy SiCH5+ ion-beam to Si substrate during chemical vapor deposition process using methylsilane
    Yoshimura, Satoru
    Sugimoto, Satoshi
    Takeuchi, Takae
    Murai, Kensuke
    Kiuchi, Masato
    AIP ADVANCES, 2022, 12 (11)
  • [36] Low-energy ion-scattering spectroscopic analysis of structural damage in Si substrate under ultrathin SiO2 after gate etching
    Matsui, M
    Uchida, F
    Tokunaga, T
    Enomoto, H
    Umezawa, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1999, 38 (4A): : 2124 - 2130
  • [37] In situ analysis of Si(100) surface damage induced by low-energy rare-gas ion bombardment using x-ray photoelectron spectroscopy
    Ishii, M
    Hirose, Y
    Sato, T
    Ohwaki, T
    Taga, Y
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1997, 15 (03): : 820 - 824
  • [38] Production of low-energy SiCH3+ and SiC2H7+ ion beams for 3C-SiC film formation by selecting fragment ions from dimethylsilane
    Yoshimura, Satoru
    Sugimoto, Satoshi
    Takeuchi, Takae
    Murai, Kensuke
    Kiuchi, Masato
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2021, 487 : 85 - 89
  • [39] Rapid enhancement of low-energy (<100eV) ion flux in response to interplanetary shocks based on two Van Allen Probes case studies: Implications for source regions and heating mechanisms
    Yue, Chao
    Li, Wen
    Nishimura, Yukitoshi
    Zong, Qiugang
    Ma, Qianli
    Bortnik, Jacob
    Thorne, Richard M.
    Reeves, Geoffrey D.
    Spence, Harlan E.
    Kletzing, Craig A.
    Wygant, John R.
    Nicolls, Michael J.
    JOURNAL OF GEOPHYSICAL RESEARCH-SPACE PHYSICS, 2016, 121 (07) : 6430 - 6443
  • [40] Formation of Cun+ (n=1-3), Arn+ (n=1, 2), and ArCu+ ions during sputtering of a copper surface by low-energy Ar+ ion bombardment in a dilute argon atmosphere
    Hippler, Rainer
    Denker, Christian
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2018, 27 (06)