Dual wavelength optical metrology using ptychography

被引：45

作者：

Claus, D. ^{[1
]}

Robinson, D. J. ^{[2
]}

Chetwynd, D. G. ^{[2
]}

Shuo, Y. ^{[3
]}

Pike, W. T. ^{[3
]}

Garcia, Jose J. De J. Toriz ^{[1
]}

Rodenburg, J. M. ^{[1
]}

机构：

[1] Univ Sheffield, Sch Engn, Sheffield S3 7HQ, S Yorkshire, England

[2] Univ Warwick, Sch Engn, Coventry CV4 7AL, W Midlands, England

[3] Univ London Imperial Coll Sci Technol & Med, London SW7 2AZ, England

来源：

JOURNAL OF OPTICS | 2013年 / 15卷 / 03期

基金：

英国工程与自然科学研究理事会;

关键词：

phase retrieval; metrological applications; diffraction and scattering; wave optics; PHASE RETRIEVAL; ILLUMINATION; INTERFERENCE; DIFFRACTION; HOLOGRAPHY; ALGORITHM; OBJECT; IMAGE;

D O I：

10.1088/2040-8978/15/3/035702

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We describe an experimental implementation of ptychography to optical metrology, in particular topography measurement, in combination with the dual wavelength method. This is the first published account of the application of the dual wavelength method to ptychography or any other phase retrieval method in order to obtain surface height information over a wide range of scales, from small fractions of a wavelength up to many tens of wavelengths, in reflection mode. Moreover, the work presented here is the first report on the application of lensless reflection mode ptychography. Advantages of the ptychographic dual wavelength method are compared with other optical topography measurement techniques, especially with respect to the experimental procedures and constraints and the analysis of the data. We show that dual wavelength ptychography can remove material-specific phase changes which adversely affect topography measurements using white light profilometry.

引用

页数：7

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