Fabrication and photodegradation behavior of photosensitive polyimide LB film

被引：6

作者：

Oh, SY ^{[1
]}

Park, JK

Choi, JW

Chung, CM

机构：

[1] Sogang Univ, Dept Chem Engn, Seoul 121742, South Korea

[2] Yonsei Univ, Dept Chem, Wonju 220710, South Korea

来源：

MOLECULAR CRYSTALS AND LIQUID CRYSTALS | 2001年 / 370卷

关键词：

polyamic acid; polyimide LB film; photodegradation behavior; positive resist; resolution;

D O I：

10.1080/10587250108030063

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Ultra thin film of polyamic acid having benzene and sulfonyloxyimide moieties was fabricated with a LB technique and then photosensitive polyimide LB film was obtained by the precursor method. Physical properties and photodegradation behavior of polyimide LB film were investigated by pi -A isotherm, UV-Visible and FT-IR spectroscopic measurements. Especially, it has been found that the ultra thin LB film of polyimide is an effective positive type resist material for obtaining high lithographic resolution.

引用

页码：169 / 172

页数：4