A study of high-quality freestanding diamond films grown by MPCVD

被引：55

作者：

Ding, Ming Q. ^{[1
]}

Li, Lili ^{[1
]}

Feng, Jinjun ^{[1
]}

机构：

[1] Beijing Vacuum Elect Res Inst, Natl Key Lab Sci & Technol Vacuum Elect, Beijing 100016, Peoples R China

来源：

APPLIED SURFACE SCIENCE | 2012年 / 258卷 / 16期

关键词：

Microwave Plasma Chemical Vapor Deposition; Freestanding diamond films; Texture; Optical transmission; CHEMICAL-VAPOR-DEPOSITION; HIGH-PRESSURE; HIGH-POWER; MICROWAVE; SILICON; REACTOR;

D O I：

10.1016/j.apsusc.2012.02.025

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The fabrication process of high-quality freestanding diamond films grown by Microwave Plasma Chemical Vapor Deposition (MPCVD) was studied. Under the optimal condition, freestanding diamond films 55 mm in diameter with a thickness up to 1 mm were fabricated, showing an excellent crystalline structure as examined from Raman and X-Ray Diffraction (XRD) spectra. For most processing conditions, including substrate temperatures varied from 800 to 1050 degrees C, the films were found in a [1 1 1] preferential texture, whereas [2 2 0] and [0 0 1] film textures occurred in some special cases. Optical measurements of one side polished diamond films showed a cutoff wavelength 225 nm, and a transmission >= 70% at lambda >= 2.5 mu m. (C) 2012 Elsevier B.V. All rights reserved.

引用

页码：5987 / 5991

页数：5

共 22 条

[1] Large area deposition of ⟨100⟩-textured diamond films by a 60-kW microwave plasma CVD reactor [J].