Spin exchange between a quantum well and the donor layer in Si/Si1-xCx

被引:8
作者
Kümmerer, HJ
Hüftle, K
Weinzierl, C
Denninger, G
Nestle, N
Eberl, K
机构
[1] Univ Stuttgart, Inst Phys 2, D-70550 Stuttgart, Germany
[2] Univ Ulm, Sekt NMR, D-89069 Ulm, Germany
[3] MPI Feskorperforsch, D-70569 Stuttgart, Germany
来源
PHYSICAL REVIEW B | 1999年 / 59卷 / 19期
关键词
D O I
10.1103/PhysRevB.59.12568
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Electron-spin-resonance (ESR) data from modulation-doped Si/Si1-xCx heterostructures are reported. The experiments at high ESR frequency (94 GHz) and corresponding high magnetic field (3.5 T) enabled us to separate the ESR of the conduction electrons in the quantum well from the ESR of the phosphorous donors in the doping layer. At temperatures above 20 K a thermally activated electron-exchange process between the quantum well and the donor layer is observed. The effective activation energy of this process is approximate to 19 meV. The g factors of the conduction electrons and of the P donors were determined with high absolute accuracy. [S0163-1829(99)02319-X].
引用
收藏
页码:12568 / 12572
页数:5
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