Exchange bias effects of NiFe/NiO bilayers through ion-beam bombardment on the NiO surface

被引:18
作者
Li, Guijun [1 ]
Leung, Chi Wah [2 ]
Shueh, Chin [3 ]
Hsu, Hsun-Feng [3 ]
Huang, Hsuan-Rong [3 ]
Lin, Ko-Wei [3 ]
Lai, Pui To [1 ]
Pong, Philip W. T. [1 ]
机构
[1] Univ Hong Kong, Dept Elect & Elect Engn, Hong Kong, Hong Kong, Peoples R China
[2] Hong Kong Polytech Univ, Dept Appl Phys, Hong Kong, Hong Kong, Peoples R China
[3] Natl Chung Hsing Univ, Dept Mat Sci & Engn, Taichung 40227, Taiwan
关键词
Exchange bias; Ion-beam bombardment; Magnetic thin films; NIO/NIFE; TEMPERATURE; DEPOSITION; FILMS; FIELD;
D O I
10.1016/j.surfcoat.2012.05.035
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The influence of ion-beam bombardment of the NiO surface on the exchange bias behavior of NiFe/NiO bilayers was systemically investigated with different bombardment energies and durations. The results show that by varying the bombardment energies, different crystallographic orientations are created which modifies the NiO spin structures. This results in the changes in the coupling type in NiO when it is in contact with the NiFe layer. The NiFe/NiO bilayers exhibited either enhanced or decreased exchange bias filed, depending on the uncompensated moments or misaligned NiO spin created by ion-beam bombardment. The variations in coercivities of NiFe/NiO bilayers imply that the NiO anisotropy could be tuned by ion-beam bombardment. (C) 2012 Elsevier B.V. All rights reserved.
引用
收藏
页码:S437 / S441
页数:5
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