Wafer-level MEMS Package and Its Reliability Issues

被引:0
作者
Tanaka, Shuji [1 ]
Esashi, Masayoshi [1 ]
机构
[1] Tohoku Univ, Sendai, Miyagi 980, Japan
来源
2013 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM (IRPS) | 2013年
关键词
Wafer-level packaging; Micro electro mechanical systems (MEMS); Anodic bonding; Electrical feedthrough; Low temperature cofired ceramics (LTCC);
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper reviews wafer-level hermetic packaging technology using anodic bonding from several reliability points of view. First, reliability risk factors of high temperature, high voltage and electrochemical O-2 generation during anodic bonding are discussed. Next, electrical interconnections through a hermetic package, i.e. electrical feedthrough, is discussed. The reliability of both hermetic sealing and electrical feedthrough must be simultaneously satisfied. A new wafer-level MEMS packaging material, anodically-bondable low temperature cofired ceramic (LTCC) wafer, is introduced, and its reliability data on hermetic sealing, electrical interconnection and flip-chip mounting on a printed circuit board (PCB) are described.
引用
收藏
页数:5
相关论文
共 19 条
[1]   Long-term and accelerated life testing of a novel single-wafer vacuum encapsulation for MEMS resonators [J].
Candler, Rob N. ;
Hopcroft, Matthew A. ;
Kim, Bongsang ;
Park, Woo-Tae ;
Melamud, Renata ;
Agarwal, Manu ;
Yama, Gary ;
Partridge, Aaron ;
Lutz, Markus ;
Kenny, Thomas W. .
JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, 2006, 15 (06) :1446-1456
[2]   The analysis of oxygen plasma pretreatment for improving anodic bonding [J].
Choi, SW ;
Choi, WB ;
Lee, YH ;
Ju, BK ;
Sung, MY ;
Kim, BH .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2002, 149 (01) :G8-G11
[3]   Wafer level packaging of MEMS [J].
Esashi, Masayoshi .
JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2008, 18 (07)
[4]  
Hayashi Risa, 2011, IEEJ 28 SENS S TOK J, P93
[5]   VACUUM PACKAGING FOR MICROSENSORS BY GLASS SILICON ANODIC BONDING [J].
HENMI, H ;
SHOJI, S ;
SHOJI, Y ;
YOSHIMI, K ;
ESASHI, M .
SENSORS AND ACTUATORS A-PHYSICAL, 1994, 43 (1-3) :243-248
[6]  
Ikeda Kyoichi, 1988, IEEJ 7 SENS S TOK JA, P55
[7]  
Ko S., 1999, Transactions of the Institute of Electrical Engineers of Japan, Part E, V119-E, P368, DOI 10.1541/ieejsmas.119.368
[8]   AN INTEGRATED MINIATURE CAPACITIVE PRESSURE SENSOR [J].
KUDOH, T ;
SHOJI, S ;
ESASHI, M .
SENSORS AND ACTUATORS A-PHYSICAL, 1991, 29 (03) :185-193
[9]   Fabrication of high-density electrical feed-throughs by deep-reactive-ion etching of Pyrex glass [J].
Li, XG ;
Abe, T ;
Liu, YX ;
Esashi, M .
JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, 2002, 11 (06) :625-630
[10]   Deep reactive ion etching of Pyrex glass using SF6 plasma [J].
Li, XH ;
Abe, T ;
Esashi, M .
SENSORS AND ACTUATORS A-PHYSICAL, 2001, 87 (03) :139-145