Fabrication of High-Quality VO2 Thin Films by Ion-Assisted Dual ac Magnetron Sputtering

被引:58
作者
Ba, Cheilchou [1 ]
Bah, Souleymane T. [1 ]
D'Auteuil, Marc [1 ]
Ashrit, P. V. [2 ]
Vallee, Real [1 ]
机构
[1] Univ Laval, COPL, Quebec City, PQ G1V 0A6, Canada
[2] Univ Moncton, Thin Films & Photon Res Grp GCMP, Dept Phys & Astron, Moncton, NB E1A 3E9, Canada
基金
加拿大自然科学与工程研究理事会;
关键词
thermochromics; vanadium oxide; ac cathodic sputtering; microstructure; transition temperature; optical switching; PHASE-TRANSITION; METAL; XPS;
D O I
10.1021/am403807u
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The technique of cathodic ac dual magnetron sputtering along with the high energy ionic bombardment is known to yield high-quality thin films in terms of their uniformity and high density. This technique has been applied for the first time to achieve thermochromic VO2 thin films that show a high optical and electrical contrast between normal and switched states. In this two-step process Vanadium metal films were deposited and subsequently oxidized in optimum conditions to achieve stoichiometric VO2 films. Typical films switched between more than 40 % to less than 5 % transmission in the infrared region while undergoing an electrical sheet resistance change between 1 x 10(5) and 1 x 10(2) Omega/cm(2). The application potential of such VO2 films in integrated optics is deemed high.
引用
收藏
页码:12520 / 12525
页数:6
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