Strategy for Enhancing Ultrahigh-Molecular-Weight Block Copolymer Chain Mobility to Access Large Period Sizes (>100 nm)

被引:16
作者
Cummins, Cian [2 ,3 ]
Alvarez-Fernandez, Alberto [1 ]
Bentaleb, Ahmed [2 ]
Hadziioannou, Georges [3 ]
Ponsinet, Virginie [2 ]
Fleury, Guillaume [3 ]
机构
[1] UCL, Dept Chem Engn, London WC1E 7JE, England
[2] Univ Bordeaux, CNRS, Ctr Rech Paul Pascal, UMR 5031, F-33600 Pessac, France
[3] Univ Bordeaux, CNRS, Bordeaux INP, LCPO,UMR 5629, F-33600 Pessac, France
关键词
Energy gap - Lamellar structures - Molecular weight - Styrene - Block copolymers - Photonic band gap;
D O I
10.1021/acs.langmuir.0c02261
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Assembling ultrahigh-molecular-weight (UHMW) block copolymers (BCPs) in rapid time scales is perceived as a grand challenge in polymer science due to slow kinetics. Through surface engineering and identifying a nonvolatile solvent (propylene glycol methyl ether acetate, PGMEA), we showcase the impressive ability of a series of lamellar poly(styrene)-block-poly(2-vinylpyridine) ( PS-b-P2VP) BCPs to selfassemble directly after spin-coating. In particular, we show the formation of large-period (approximate to 111 nm) lamellar structures from a neat UHMW PS-bP2VP BCP. The significant influence of solvent-polymer solubility parameters are explored to enhance the polymer chain mobility. After optimization using solvent vapor annealing, increased feature order of ultralarge-period PS-b-P2VP BCP patterns in 1 h is achieved. Isolated metallic and dielectric features are also demonstrated to exemplify the promise that large BCP periods offer for functional applications. The methods described in this article center on industry-compatible patterning schemes, solvents, and deposition techniques. Thus, our straightforward UHMW BCP strategy potentially paves a viable and practical path forward for large-scale integration in various sectors, e.g., photonic band gaps, polarizers, and membranes that demand ultralarge period sizes.
引用
收藏
页码:13872 / 13880
页数:9
相关论文
共 61 条
[41]   Fabrication of highly ordered silicon oxide dots and stripes from block copolymer thin films [J].
Park, Soojin ;
Kim, Bokyung ;
Wang, Jia-Yu ;
Russell, Thomas P. .
ADVANCED MATERIALS, 2008, 20 (04) :681-+
[42]   Solvent-induced transition from micelles in solution to cylindrical microdomains in diblock copolymer thin films [J].
Park, Soojin ;
Wang, Jia-Yu ;
Kim, Bokyung ;
Chen, Wei ;
Russell, Thomas P. .
MACROMOLECULES, 2007, 40 (25) :9059-9063
[43]   Preparation of Metallic Line Patterns from Functional Block Copolymers [J].
Park, Soojin ;
Kim, Bokyung ;
Cirpan, Ali ;
Russell, Thomas P. .
SMALL, 2009, 5 (11) :1343-1348
[44]   Lateral Ordering of Cylindrical Microdomains Under Solvent Vapor [J].
Park, Soojin ;
Kim, Bokyung ;
Xu, Ji ;
Hofmann, Tommy ;
Ocko, Benjamin M. ;
Russell, Thomas P. .
MACROMOLECULES, 2009, 42 (04) :1278-1284
[45]   A Route to Nanoscopic Materials via Sequential Infiltration Synthesis on Block Copolymer Templates [J].
Peng, Qing ;
Tseng, Yu-Chih ;
Darling, Seth B. ;
Elam, Jeffrey W. .
ACS NANO, 2011, 5 (06) :4600-4606
[46]   High molecular weight block copolymer lithography for nanofabrication of hard mask and photonic nanostructures [J].
Rasappa, Sozaraj ;
Hulkkonen, Hanna ;
Schulte, Lars ;
Ndoni, Sokol ;
Reuna, Jamb ;
Salminen, Turkka ;
Niemi, Tapio .
JOURNAL OF COLLOID AND INTERFACE SCIENCE, 2019, 534 :420-429
[47]   Three-Dimensional Nanofabrication by Block Copolymer Self-Assembly [J].
Ross, Caroline A. ;
Berggren, Karl K. ;
Cheng, Joy Y. ;
Jung, Yeon Sik ;
Chang, Jae-Byum .
ADVANCED MATERIALS, 2014, 26 (25) :4386-4396
[48]   Well-Organized Mesoporous TiO2 Photoelectrodes by Block Copolymer-Induced Sol-Gel Assembly for Inorganic-Organic Hybrid Perovskite Solar Cells [J].
Sarkar, Arpita ;
Jeon, Nam Joong ;
Noh, Jun Hong ;
Seok, Sang Il .
JOURNAL OF PHYSICAL CHEMISTRY C, 2014, 118 (30) :16688-16693
[49]   Functional Block Copolymers: Nanostructured Materials with Emerging Applications [J].
Schacher, Felix H. ;
Rupar, Paul A. ;
Manners, Ian .
ANGEWANDTE CHEMIE-INTERNATIONAL EDITION, 2012, 51 (32) :7898-7921
[50]   Multicomponent Nanopatterns by Directed Block Copolymer Self-Assembly [J].
Shin, Dong Ok ;
Mun, Jeong Ho ;
Hwang, Geon-Tae ;
Yoon, Jong Moon ;
Kim, Ju Young ;
Yun, Je Moon ;
Yang, Yong-Biao ;
Oh, Youngtak ;
Lee, Jeong Yong ;
Shin, Jonghwa ;
Lee, Keon Jae ;
Park, Soojin ;
Kim, Jaeup U. ;
Kim, Sang Ouk .
ACS NANO, 2013, 7 (10) :8899-8907