The effect of the substrate position on microwave plasma chemical vapor deposition of diamond films

被引：3

作者：

Lin, CR ^{[1
]}

Su, CH ^{[1
]}

Hung, CH ^{[1
]}

Chang, C ^{[1
]}

Yan, SH ^{[1
]}

机构：

[1] Natl Taipei Univ Technol, Grad Inst Mech & Elect Engn, Taipei 106, Taiwan

来源：

SURFACE & COATINGS TECHNOLOGY | 2006年 / 200卷 / 10期

关键词：

working distance; plasma effect; plasma core; diamond characteristic qualities;

D O I：

10.1016/j.surfcoat.2005.07.034

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The study is made on synthesizing diamond films using microwave plasma chemical vapor deposition (MPCVD) method, the kinetic energy uniformity of particles just above substrate surface are found to be improved as the substrate moved toward the plasma core. However, the deposition of non-diamond carbons will form if the substrate is placed close enough to the plasma core. It shows that the diamond characteristic qualities of the diamond film can be significantly promoted by adequately adjusting the working distance. A large area diamond film with consistent diamond qualities over various surface regions can thus be successfully synthesized using lower power plasma. (c) 2005 Elsevier B.V. All rights reserved.

引用

页码：3156 / 3159

页数：4

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