On the Self-Assembly of Brush Block Copolymers in Thin Films

被引:93
作者
Hong, Sung Woo [1 ]
Gu, Weiyin [1 ]
Huh, June [2 ]
Sveinbjornsson, Benjamin R. [3 ]
Jeong, Gajin [1 ]
Grubbs, Robert Howard [3 ]
Russell, Thomas P. [1 ]
机构
[1] Univ Massachusetts, Dept Polymer Sci & Engn, Amherst, MA 01003 USA
[2] Yonsei Univ, Dept Mat Sci & Engn, Seoul 120749, South Korea
[3] CALTECH, Div Chem & Chem Engn, Pasadena, CA 91125 USA
关键词
brush polymers; solvent-annealing; self-assembly; periodic nanopatterns; large feature sizes; DIBLOCK COPOLYMERS; ARRAYS; NANOSTRUCTURES; FABRICATION; ORIENTATION; DENSITY; DOMAINS; ATRP;
D O I
10.1021/nn402639g
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
We describe a simple route to fabricate two dimensionally well-ordered, periodic nanopatterns using the self-assembly of brush block copolymers (brush BCPs). Well-developed lamellar microdomains oriented perpendicular to the substrate are achieved, without modification of the underlying substrates, and structures with feature sizes greater than 200 nm are generated due to the reduced degree of chain entanglements of brush BCPs. A near-perfect linear scaling law was found for the period, L, as a function of backbone degree of polymerization (DP) for two series of brush BCPs. The exponent increases slightly from 0.99 to 1.03 as the side chain molecular weight increases from similar to 2.4 to similar to 4.5 kg/mol(-1) and saturated with further increase in the side chain molecular weight due to the entropic penalty associated with the packing of the side chains. Porous templates and scaffolds from brush BCP thin films are also obtained by selective etching of one component.
引用
收藏
页码:9684 / 9692
页数:9
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