Nanoscale Block Copolymer Ordering Induced by Visible Interferometric Micropatterning: A Route towards Large Scale Block Copolymer 2D Crystals

被引：39

作者：

Aissou, Karim ^{[1
]}

Shaver, Jonah ^{[2
]}

Fleury, Guillaume ^{[1
]}

Pecastaings, Gilles ^{[1
]}

Brochon, Cyril ^{[1
]}

Navarro, Christophe ^{[3
]}

Grauby, Stephane ^{[2
]}

Rampnoux, Jean-Michel ^{[2
]}

Dilhaire, Stefan ^{[2
]}

Hadziioannou, Georges ^{[1
]}

机构：

[1] Univ Bordeaux, Lab Chim Polymeres Organ, CNRS, LCPO,UMR 5629, F-33600 Pessac, France

[2] Univ Bordeaux, Lab Ondes & Mat Aquitaine, CNRS, LOMA,UMR 5798, F-33400 Talence, France

[3] ARKEMA, Groupement Rech Lacq, RN 117, F-64170 Lacq, France

来源：

ADVANCED MATERIALS | 2013年 / 25卷 / 02期

关键词：

block copolymers; surface relief grating; thin films; corrugated substrates; microstructures; micropatterning; 2D crystals; DIBLOCK COPOLYMER; THIN-FILMS; FEPT NANOPARTICLES; SYSTEM; LITHOGRAPHY; SURFACES; DOMAINS; ARRAYS;

D O I：

10.1002/adma.201203254

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

We have overcome the cost and time consumption limitations of common lithography techniques used to control the self-assembly of block copolymers into highly ordered 2D arrays through the use of a guiding pattern created from a polymeric sub-layer. The guiding pattern is a sinusoidal surface-relief grating interferometrically inscribed onto an azobenzene containing copolymer sub-layer leading to a defect-free single grain of block copolymer domains. © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

引用

页码：213 / 217

页数：5

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